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Created with Pixso. SiC Coating Machine – Precise Adhesive Deposition for Wafers & Graphite Materials

SiC Coating Machine – Precise Adhesive Deposition for Wafers & Graphite Materials

Nazwa marki: ZMSH
MOQ: 1
Czas dostawy: 2-4 TYGODNIE
Warunki płatności: T/T
Szczegółowe informacje
Miejsce pochodzenia:
Szanghaj, Chiny
Wymiary maszyny:
920 × 1060 × 1620 mm
Skuteczny obszar powłoki:
500 × 500 mm
Zasilanie:
120 V / 220 V ±10%, 50–60 Hz
Typ dyszy:
Ultradźwiękowe, dostępnych wiele opcji
Grubość powłoki:
20 nm – dziesiątki µm
Natężenie przepływu cieczy:
0,006 – 3 ml/s
Pozycjonowanie:
Wyrównywanie laserowe
Sterowanie ruchem:
Osie skoordynowane XYZ, niezależnie programowane
Dostawa cieczy:
Stały przepływ z dyspersją online
Gospodarowanie odpadami:
Dysza samoczyszcząca, recykling ścieków, układ wydechowy
Podkreślić:

Precise Adhesive Deposition SiC Coating Machine

,

Automated Operation Adhesive Deposition Machine

,

Broad Compatibility Semiconductor Coating System

Opis produktu

SiC Coating Machine – Precise Adhesive Deposition for Wafers & Graphite Materials


Product Overview


The SiC Coating Machine is a fully automated, programmable standalone system designed for precise adhesive deposition between wafers, SiC seeds, graphite paper, and graphite plates.

It ensures controlled and uniform coating thickness, preventing local buildup or thin spots, and provides a stable foundation for subsequent vacuum degassing and high-temperature sintering.

Ideal for pilot-scale or medium-to-large batch production, the system supports high repeatability and consistent coating quality.


SiC Coating Machine – Precise Adhesive Deposition for Wafers & Graphite Materials 0SiC Coating Machine – Precise Adhesive Deposition for Wafers & Graphite Materials 1


Key Features


  • Precise Coating: Controlled adhesive thickness ensures uniform deposition between wafers, graphite paper, and graphite plates.SiC Coating Machine – Precise Adhesive Deposition for Wafers & Graphite Materials 2

  • Broad Compatibility: Works with adhesives containing solid particles, supporting a wide range of formulations.

  • Automated Operation: Programmable standalone control with coordinated XYZ motion; suitable for batch or pilot-scale production.

  • Stable Pre-Treatment: Provides a reliable foundation for subsequent vacuum degassing and high-temperature sintering.

  • High Repeatability: Ensures consistent coating across all batches, improving yield and process stability.


Specifications


Parameter Specification Notes
Machine Dimensions 920 × 1060 × 1620 mm Standard model, customizable
Effective Coating Area 500 × 500 mm Expandable
Power Supply 120V / 220V ±10%, 50–60Hz Region-dependent
Nozzle Type Ultrasonic, multiple options available Compatible with various coating thickness requirements
Coating Thickness 20 nm – tens of µm Precisely controlled, avoids local buildup or thin coating
Liquid Flow Rate 0.006 – 3 ml/s Depends on solvent and nozzle type
Positioning Laser alignment Accurate nozzle positioning
Motion Control XYZ coordinated axes, independently programmable Supports batch or pilot-scale production
Liquid Delivery Constant-flow with online dispersion Handles solid-containing adhesives, prevents sedimentation
Waste Management Auto-cleaning nozzle, waste liquid recycling, exhaust system Reduces maintenance cost
Heating Micron-scale vacuum adsorption heating plate, multi-zone control Suitable for flexible substrates such as battery separators
High-Temperature Option Up to 750°C hot plate Enables spray pyrolysis thin-film preparation


Typical Applications


  • Semiconductors & SiC Crystal Growth: Seed bonding, wafer preparation

  • Conductive & Functional Coatings: SiC, flux, photoresist coatings

  • Flexible Substrates & Battery Separators: Handles solid-containing adhesive solutions

  • Glass & Photovoltaic Materials: Uniform coating between graphite plates and paper


FAQ – Frequently Asked Questions


Q1: Can the machine handle adhesives containing solids?
A1: Yes. The machine uses high-precision constant-flow delivery with online dispersion, ensuring uniform spraying of solid-containing adhesives without nozzle clogging.


Q2: How precise is the coating thickness control?
A2: Coating thickness ranges from 20 nm to tens of microns, with precise control for uniformity and repeatability.


Q3: What types of substrates are supported?SiC Coating Machine – Precise Adhesive Deposition for Wafers & Graphite Materials 3
A3: Wafers, SiC seeds, graphite paper, and graphite plates, including flexible substrates with vacuum-assisted heating.


Q4: Can the machine be used for batch production?
A4: Yes. The XYZ-axis programmable control supports pilot-scale to medium-large batch production, with multi-nozzle parallel operation.


Q5: How is coating uniformity ensured?
A5: Laser alignment, constant-flow delivery, multi-nozzle synchronization, and ultrasonic nozzle technology ensure >95% uniformity.


Q6: Is machine maintenance complicated?
A6: No. The machine is equipped with auto-cleaning nozzles, waste liquid recycling, and exhaust systems, minimizing maintenance requirements.