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Created with Pixso. 8-12 Inch Glass Wafer Substrates for Semiconductor and Advanced Packaging Applications

8-12 Inch Glass Wafer Substrates for Semiconductor and Advanced Packaging Applications

Nazwa marki: ZMSH
MOQ: 10
Czas dostawy: 2-4 tygodnie
Warunki płatności: T/T
Szczegółowe informacje
Miejsce pochodzenia:
Szanghaj, Chiny
Średnica:
200 mm (8"), 250 mm (10"), 300 mm (12")
Opcje materiałowe:
Szkło borokrzemianowe, topiona krzemionka, szkło kwarcowe, szkło glinokrzemianowe
Grubość:
100 µm – 2000 µm
Wykończenie powierzchni:
SSP / DSP
TTV:
Dostosowane
Łuk i Warp:
Dostosowane
Typ krawędzi:
Zaokrąglona krawędź / fazowana krawędź
Przezroczystość:
Wysoka transmisja optyczna
Opis produktu

Glass wafer substrates are increasingly used in advanced semiconductor packaging, MEMS devices, photonics, RF components, optical integration, and Through-Glass Via (TGV) technologies. Compared with conventional silicon substrates, glass wafers offer excellent electrical insulation, low dielectric loss, superior dimensional stability, and outstanding optical transparency.

Our 8-inch, 10-inch, and 12-inch glass wafer substrates are manufactured to meet the stringent requirements of semiconductor fabrication and wafer-level packaging processes. Multiple glass materials, thicknesses, surface finishes, and custom machining services are available to support both R&D and volume production requirements.

8-12 Inch Glass Wafer Substrates for Semiconductor and Advanced Packaging Applications 08-12 Inch Glass Wafer Substrates for Semiconductor and Advanced Packaging Applications 18-12 Inch Glass Wafer Substrates for Semiconductor and Advanced Packaging Applications 2


Key Features

  • Available in 8", 10", and 12" wafer formats
  • Excellent surface flatness and dimensional stability
  • High optical transparency across visible and infrared wavelengths
  • Low dielectric constant and low signal loss
  • Suitable for TGV (Through-Glass Via) processing
  • Double-side polished (DSP) surfaces available
  • Compatible with semiconductor cleanroom environments
  • Custom thickness, edge profile, and precision machining services
  • Suitable for wafer-level packaging and photonic integration

Typical Specifications

Parameter Specification
Diameter 200 mm (8"), 250 mm (10"), 300 mm (12")
Material Options Borosilicate Glass, Fused Silica, Quartz Glass, Aluminosilicate Glass
Thickness 100 μm – 2000 μm
Surface Finish SSP / DSP
TTV Customized
Bow & Warp Customized
Edge Type Rounded Edge / Chamfered Edge
Transparency High Optical Transmission
Custom Processing TGV, Laser Drilling, Dicing, Coating, Patterning

Applications

Advanced Semiconductor Packaging

Glass wafers are widely adopted in advanced packaging technologies, including interposers, redistribution layers (RDL), fan-out packaging, and heterogeneous integration.

Through-Glass Via (TGV)

Glass substrates provide an ideal platform for TGV fabrication due to their electrical insulation, dimensional stability, and compatibility with high-density interconnect architectures.

MEMS Devices

Suitable for pressure sensors, accelerometers, microfluidic chips, and other MEMS applications requiring excellent flatness and transparency.

Photonics and Optical Integration

Used in optical communication modules, silicon photonics, optical sensors, micro-optical assemblies, and photonic integrated circuits (PICs).

RF and High-Frequency Devices

Low dielectric loss characteristics make glass wafers attractive for high-frequency communication and RF packaging applications.


Advantages of Glass Wafer Substrates

Compared with traditional silicon wafers, glass wafer substrates offer:

  • Lower dielectric constant
  • Reduced signal transmission loss
  • Better electrical insulation
  • Higher optical transparency
  • Improved design flexibility
  • Compatibility with advanced packaging architectures

These advantages make glass wafers an important enabling material for next-generation AI computing, high-speed communication, photonics, and advanced semiconductor manufacturing.

8-12 Inch Glass Wafer Substrates for Semiconductor and Advanced Packaging Applications 3


Customization Services

We provide customized solutions including:

  • Wafer diameter customization
  • Thickness grinding and polishing
  • Double-side polishing (DSP)
  • TGV processing support
  • Precision dicing
  • Laser drilling
  • Thin wafer handling
  • Optical coatings
  • Metallization and patterning support

8-12 Inch Glass Wafer Substrates for Semiconductor and Advanced Packaging Applications 4


FAQ

Can glass wafer substrates be supplied in both 8-inch and 12-inch formats?

Yes. Standard diameters include 8-inch (200 mm), 10-inch (250 mm), and 12-inch (300 mm), with custom sizes available upon request.

Which glass materials are available?

Common options include borosilicate glass, fused silica, quartz glass, and aluminosilicate glass. Material selection depends on the application's thermal, electrical, and optical requirements.

Are custom thicknesses and surface finishes available?

Yes. We support customized thicknesses, SSP or DSP polishing, precision edge processing, and additional wafer-level fabrication services.