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Created with Pixso. High Purity Sapphire Ingot for Optical & Semiconductor Applications

High Purity Sapphire Ingot for Optical & Semiconductor Applications

Nazwa marki: ZMSH
Numer modelu: Szafirowa sztabka
MOQ: 1
Cena £: by case
Czas dostawy: 2-4 tygodnie
Warunki płatności: T/T
Szczegółowe informacje
Miejsce pochodzenia:
Chiny
Miejsce pochodzenia:
Szanghaj, Chiny
Rozmiar:
Dostosowane
Twardość Mohsa:
9
Przewodność cieplna:
23,1 W/m·K (równolegle), 25,2 W/m·K (prostopadle)
Aplikacja:
Uprawiaj nanomateriały, skaningowy mikroskop elektronowy (SEM)
Atrakcja:
Sztabka szafirowa 200 kg, sztabka szafirowa Al₂O₃, sztabka szafirowa 400 kg
Opis produktu

Product Description

 

Sapphire ingots are high-purity single crystal Al₂O₃ materials with excellent hardness, optical transparency, and thermal stability. Manufactured using advanced crystal growth technologies, sapphire ingots are widely used in semiconductor, optical, LED, laser, and industrial applications.

 

ZMSH provides sapphire ingots in various sizes and crystal orientations to meet different processing requirements. With superior chemical resistance, electrical insulation, and high mechanical strength, sapphire ingots perform reliably in harsh and high-temperature environments.

 

Our sapphire ingots are suitable for wafer production, optical windows, laser components, precision mechanical parts, and scientific equipment. Customized dimensions and specifications are available according to customer requirements, ensuring stable quality and consistent performance for advanced industrial applications.

 

 

 

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Sapphire Ingot Key Features

 

High Purity Sapphire Ingot for Optical & Semiconductor Applications 2

  • High Purity: Ultra-pure single crystal Al₂O₃ with excellent material consistency.
  • Crystal Orientation: Available in C-plane, A-plane, R-plane, and customized orientations.
  • Extreme Hardness: Mohs hardness of 9, offering outstanding wear and scratch resistance.
  • Excellent Optical Transmission: High transparency from UV to infrared wavelengths.
  • Superior Thermal Stability: Reliable performance under high-​temperature environments.
  • Electrical Insulation: High resistivity and stable dielectric properties.
  • Chemical Resistance: Resistant to acids, alkalis, and harsh corrosive conditions.
  • High Mechanical Strength: Suitable for precision processing and advanced industrial applications.
  • Customizable Specifications: Various sizes, orientations, and surface finishes available.

 

 


 

Sapphire Ingot Growth Methods

 

  • Kyropoulos (KY): Large high-quality ingots, low impurities.
  • Czochralski (CZ): Versatile method, widely used for smaller ingots.
  • Other Methods: HEM, EFG, Verneuil, HDS (available on request).

 


 

 

Sapphire Ingot Applications

 

  • Semiconductor: Wafer substrates, epitaxial growth, and processing components.
  • Optics & Lasers: Optical windows, lenses, laser systems, and infrared components.
  • LED Industry: Sapphire substrates for LED chip manufacturing.
  • Industrial Equipment: Wear-resistant parts, furnace windows, and precision machinery components.
  • Medical Devices: Surgical tools, biosensors, and medical optical components.
  • Aerospace & Defense: Protective windows, infrared systems, and high-temperature applications.

 

 

 

High Purity Sapphire Ingot for Optical & Semiconductor Applications 3         High Purity Sapphire Ingot for Optical & Semiconductor Applications 4          High Purity Sapphire Ingot for Optical & Semiconductor Applications 5

 

 

 

 

 


 

FAQ

 

 

1. Q: What are the primary applications of sapphire ingots?

 

    A:

  • LED Substrates: The dominant application (over 95% of the market), where they are sliced and polished into wafers to grow gallium nitride (
    ) layers for blue/green/white LEDs.
  • Electronics & Mobile Devices: Used for smartphone camera covers, watch faces, and screens requiring superior scratch resistance.
  • Aerospace & Defense: Wave-transmitting windows, infrared (IR) detectors, and armored glass components.
  • Optical Components: High-strength, high-temperature windows, lenses, and lasers.

 

2. Q: How are sapphire ingots produced?

    A:

  • Raw Material: High-purity alumina (
    HPA) powder is heated above its melting point of
    2050℃.
  • Growth Methods: The most common method is the Kyropoulos (KY) method, which yields large, high-quality, low-stress crystals. Others include the Czochralski (CZ) method and Edge-defined Film-fed Growth (EFG).
  • Post-Processing: After growth, the boule is cored, oriented, sliced, and polished into wafers, or shaped into components.

 

 3. Q: What sizes and orientations are available?

 

      A: Available in 80kg, 200kg, and 400kg. Crystal orientations include A, C, and R, chosen based on application requirements. Custom sizes and technical guidance are provided.

 

 

 


 

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                                               High Purity Sapphire Ingot for Optical & Semiconductor Applications 10                                    High Purity Sapphire Ingot for Optical & Semiconductor Applications 11

 

 

 

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